Registration Materials for Laser Thermolithography

• Date: 2012
• Main Authors: Kryuchyn, A. A., Rubish, V. M., Kostiukevych, S. O., Minko, V. I., Shepelyavy, P. E., Lysyuk, V. O., Kostyukevych, K. V., Surmach, M. A.
• Format: Article
• Language: Ukrainian
• Published: Інститут проблем реєстрації інформації НАН України 2012
• Subjects: thermolithography; inorganic photoresists; nonlinear exposure characteristics
• Online Access: http://drsp.ipri.kiev.ua/article/view/105215
• Journal Title: Data Recording, Storage & Processing

The results of analysis on the photosensitive properties of materials with nonlinear exposition characteristic have been performed. It is shown that some photo(thermo)sensitive materials allow to register the image of elements having sizes less than the diameter of exposing beam. The results of lase...