Investigation of the process of microrelief structures formation in chromium films based on the method of chemical etching

• Дата: 2021
• Автори: Панкратова, А. В., Крючин, А. А., Бородін, Ю. О., Беляк, Є. В., Пригун, О. В.
• Формат: Стаття
• Мова: Ukrainian
• Опубліковано: Інститут проблем реєстрації інформації НАН України 2021
• Теми: microrelief structure; chemical etching; laser recording; sapphire substrates; mathematical modeling; chromium film; photoresist layer
• Онлайн доступ: http://drsp.ipri.kiev.ua/article/view/235022
• Назва журналу: Data Recording, Storage & Processing

Modern approaches used in the formation of microrelief structures on the surface of highly stable single-crystal substrates are considered. The priority of submicron photolithography methods, in particular, the use of plasma chemical etching with a multilayer mask is shown. The analysis of the techn...