Direct laser writing technology for microrelief metal structures on thin chromium films

• Datum: 2026
• Hauptverfasser: Чегіль, Ю. І., Буток, О. М., Беляк, Є. В., Крючин, А. А.
• Format: Artikel
• Sprache: Ukrainisch
• Veröffentlicht: Інститут проблем реєстрації інформації НАН України 2026
• Schlagworte: direct laser writing; laser ablation; microrelief structures; thin chromium films; diffraction optical elements; pulsed laser radiation; laser micromachining
• Online Zugang: https://drsp.ipri.kiev.ua/article/view/363130
• Назва журналу: Data Recording, Storage & Processing

Direct laser writing is increasingly considered a promising maskless alternative to conventional photolithography for the fabrication of microrelief structures required in photonics, micro-optics, and information-optical systems. The present study investigates the formation of micro-structured relie...