Influence of multipolar magnetic field geometry of ECR planar plasma source on plasma parameters

• Дата: 2008
• Автори: Fedorchenko, V.D., Chebotarev, V.V., Garkusha, I.E., Medvedev, A.V., Tereshin, V.I., Shevchuk, B.A.
• Формат: Стаття
• Мова: English
• Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2008
• Назва видання: Вопросы атомной науки и техники
• Теми: Low temperature plasma and plasma technologies
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/111033
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Influence of multipolar magnetic field geometry of ecr planar plasma source on plasma parameters / V.D. Fedorchenko, V.V. Chebotarev, I.E. Garkusha, A.V. Medvedev, V.I. Tereshin, B.A. Shevchuk // Вопросы атомной науки и техники. — 2008. — № 6. — С. 201-203. — Бібліогр.: 9 назв. — англ.

The plasma parameters and its homogeneity were measured in ECR planar plasma source with multipolar magnetic field, which is created by three parallel magnetic bars of 12 cm in length consisted of set of the permanent magnets of 2 cm length. Geometry of the multipolar magnetic field is able to be changed by variation of the polarity and the distance between separate magnets along the bars. For magnetic system with alternative orientation of the magnetic field the plasma density up to 2.8×10¹⁰ сm¯³ and the electron temperature about 20-22 eV were measured within the area ~ 75 cm² at the distance of 2 cm apart the magnetic structure. The uncompensated ion flow with the energies of 16-18 eV was observed for all configurations of magnetic field.