Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
The envelope method was used to determine optical constants of TiO₂ thin films deposited by DC reactive magnetron sputtering and electron-beam evaporation techniques. The density and thickness of the thin films were calculated. Optical properties of the TiO₂ thin films were strongly dependent on...
Збережено в:
| Дата: | 2011 |
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| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2011
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| Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/117790 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
irk-123456789-117790 |
|---|---|
| record_format |
dspace |
| spelling |
irk-123456789-1177902017-05-27T03:05:31Z Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. The envelope method was used to determine optical constants of TiO₂ thin films deposited by DC reactive magnetron sputtering and electron-beam evaporation techniques. The density and thickness of the thin films were calculated. Optical properties of the TiO₂ thin films were strongly dependent on the deposition technology. The TiO₂ thin films prepared by magnetron sputtering and electron-beam evaporation methods were established to be indirect band semiconductors with the band gap energies 3.15 and 3.43 eV, respectively. 2011 Article Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ. 1560-8034 PACS 78.66.-w, 81.15.Cd, Dj http://dspace.nbuv.gov.ua/handle/123456789/117790 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| description |
The envelope method was used to determine optical constants of TiO₂ thin
films deposited by DC reactive magnetron sputtering and electron-beam evaporation
techniques. The density and thickness of the thin films were calculated. Optical
properties of the TiO₂ thin films were strongly dependent on the deposition technology.
The TiO₂ thin films prepared by magnetron sputtering and electron-beam evaporation
methods were established to be indirect band semiconductors with the band gap energies
3.15 and 3.43 eV, respectively. |
| format |
Article |
| author |
Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. |
| spellingShingle |
Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques Semiconductor Physics Quantum Electronics & Optoelectronics |
| author_facet |
Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. |
| author_sort |
Brus, V.V. |
| title |
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_short |
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_full |
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_fullStr |
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_full_unstemmed |
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_sort |
comparison of optical properties of tio₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| publishDate |
2011 |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/117790 |
| citation_txt |
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ. |
| series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
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| first_indexed |
2023-10-18T20:30:38Z |
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