High-resistance low-doped GaAs and AlGaAs layers obtained by LPE

Influence of Yb and Al co-doping gallium melt during LPE growth of the GaAs epitaxial layers on their properties is investigated. It is shown that both morphology and electrophysical parameters of the films are changed under influence of the doping impurities applied. Obtained results are explained...

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Дата:2003
Автори: Krukovsky, S.I., Zayachuk, D.M., Rybak, O.V., Mryhin, I.O.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/117942
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:High-resistance low-doped GaAs and AlGaAs layers obtained by LPE / S.I. Krukovsky, D.M. Zayachuk, O.V. Rybak, I.O. Mryhin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 55-57. — Бібліогр.: 9 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-117942
record_format dspace
spelling irk-123456789-1179422017-05-28T03:04:26Z High-resistance low-doped GaAs and AlGaAs layers obtained by LPE Krukovsky, S.I. Zayachuk, D.M. Rybak, O.V. Mryhin, I.O. Influence of Yb and Al co-doping gallium melt during LPE growth of the GaAs epitaxial layers on their properties is investigated. It is shown that both morphology and electrophysical parameters of the films are changed under influence of the doping impurities applied. Obtained results are explained by simultaneous Yb gettering action with respect to oxygen and silicon in the solution-melt, and also by lowering the concentration of Si in the films due to Al entering into Ga sub-lattice. 2003 Article High-resistance low-doped GaAs and AlGaAs layers obtained by LPE / S.I. Krukovsky, D.M. Zayachuk, O.V. Rybak, I.O. Mryhin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 55-57. — Бібліогр.: 9 назв. — англ. 1560-8034 PACS: 73.61.Ey http://dspace.nbuv.gov.ua/handle/123456789/117942 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Influence of Yb and Al co-doping gallium melt during LPE growth of the GaAs epitaxial layers on their properties is investigated. It is shown that both morphology and electrophysical parameters of the films are changed under influence of the doping impurities applied. Obtained results are explained by simultaneous Yb gettering action with respect to oxygen and silicon in the solution-melt, and also by lowering the concentration of Si in the films due to Al entering into Ga sub-lattice.
format Article
author Krukovsky, S.I.
Zayachuk, D.M.
Rybak, O.V.
Mryhin, I.O.
spellingShingle Krukovsky, S.I.
Zayachuk, D.M.
Rybak, O.V.
Mryhin, I.O.
High-resistance low-doped GaAs and AlGaAs layers obtained by LPE
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Krukovsky, S.I.
Zayachuk, D.M.
Rybak, O.V.
Mryhin, I.O.
author_sort Krukovsky, S.I.
title High-resistance low-doped GaAs and AlGaAs layers obtained by LPE
title_short High-resistance low-doped GaAs and AlGaAs layers obtained by LPE
title_full High-resistance low-doped GaAs and AlGaAs layers obtained by LPE
title_fullStr High-resistance low-doped GaAs and AlGaAs layers obtained by LPE
title_full_unstemmed High-resistance low-doped GaAs and AlGaAs layers obtained by LPE
title_sort high-resistance low-doped gaas and algaas layers obtained by lpe
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2003
url http://dspace.nbuv.gov.ua/handle/123456789/117942
citation_txt High-resistance low-doped GaAs and AlGaAs layers obtained by LPE / S.I. Krukovsky, D.M. Zayachuk, O.V. Rybak, I.O. Mryhin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 55-57. — Бібліогр.: 9 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT krukovskysi highresistancelowdopedgaasandalgaaslayersobtainedbylpe
AT zayachukdm highresistancelowdopedgaasandalgaaslayersobtainedbylpe
AT rybakov highresistancelowdopedgaasandalgaaslayersobtainedbylpe
AT mryhinio highresistancelowdopedgaasandalgaaslayersobtainedbylpe
first_indexed 2023-10-18T20:30:58Z
last_indexed 2023-10-18T20:30:58Z
_version_ 1796150403734175744