Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method

In this paper, we have considered the four-contact method for measurements of the specific contact resistivity of the ohmic contacts (ρc). The presented method for measuring ρc has been compared with several other methods. Limits of applying this method have been shown.

Збережено в:
Бібліографічні деталі
Дата:2014
Автор: Sheremet, V.N.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/118426
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 4. — С. 394-397. — Бібліогр.: 8 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1184262017-05-31T03:07:10Z Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method Sheremet, V.N. In this paper, we have considered the four-contact method for measurements of the specific contact resistivity of the ohmic contacts (ρc). The presented method for measuring ρc has been compared with several other methods. Limits of applying this method have been shown. 2014 Article Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 4. — С. 394-397. — Бібліогр.: 8 назв. — англ. 1560-8034 PACS 73.40.Ns, 73.40.Cg, 85.40.-e http://dspace.nbuv.gov.ua/handle/123456789/118426 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description In this paper, we have considered the four-contact method for measurements of the specific contact resistivity of the ohmic contacts (ρc). The presented method for measuring ρc has been compared with several other methods. Limits of applying this method have been shown.
format Article
author Sheremet, V.N.
spellingShingle Sheremet, V.N.
Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Sheremet, V.N.
author_sort Sheremet, V.N.
title Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_short Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_full Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_fullStr Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_full_unstemmed Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_sort metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2014
url http://dspace.nbuv.gov.ua/handle/123456789/118426
citation_txt Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 4. — С. 394-397. — Бібліогр.: 8 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT sheremetvn metrologicalaspectsofresearchingthespecificcontactresistivityofohmiccontactsbyusingthefourcontactmethod
first_indexed 2023-10-18T20:32:18Z
last_indexed 2023-10-18T20:32:18Z
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