Two-dimensional modeling the static parameters for a submicron field-effect transistor

A comparison of two different models for simulation of submicron GaAs MESFETs static characteristics has been made. A new two-dimensional numerical model is presented to investigate the submicron field-effect transistor characteristics, the influence of the geometry of the component, like the int...

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Збережено в:
Бібліографічні деталі
Дата:2009
Автори: Zaabat, M., Draid, M.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2009
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/118847
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Two-dimensional modeling the static parameters for a submicron field-effect transistor / M. Zaabat, M. Draid // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 4. — С. 417-420. — Бібліогр.: 10 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1188472017-06-01T03:06:26Z Two-dimensional modeling the static parameters for a submicron field-effect transistor Zaabat, M. Draid, M. A comparison of two different models for simulation of submicron GaAs MESFETs static characteristics has been made. A new two-dimensional numerical model is presented to investigate the submicron field-effect transistor characteristics, the influence of the geometry of the component, like the inter-electrode distance, on the capacities. All simulation revealed the existence of a high contact electric field near the gate, which creates a depopulated zone around the gate, but the preceding studies have neglected the edge effects, which are very significant for the submicron MESFETs. 2009 Article Two-dimensional modeling the static parameters for a submicron field-effect transistor / M. Zaabat, M. Draid // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 4. — С. 417-420. — Бібліогр.: 10 назв. — англ. 1560-8034 PACS 85.30.Tv http://dspace.nbuv.gov.ua/handle/123456789/118847 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description A comparison of two different models for simulation of submicron GaAs MESFETs static characteristics has been made. A new two-dimensional numerical model is presented to investigate the submicron field-effect transistor characteristics, the influence of the geometry of the component, like the inter-electrode distance, on the capacities. All simulation revealed the existence of a high contact electric field near the gate, which creates a depopulated zone around the gate, but the preceding studies have neglected the edge effects, which are very significant for the submicron MESFETs.
format Article
author Zaabat, M.
Draid, M.
spellingShingle Zaabat, M.
Draid, M.
Two-dimensional modeling the static parameters for a submicron field-effect transistor
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Zaabat, M.
Draid, M.
author_sort Zaabat, M.
title Two-dimensional modeling the static parameters for a submicron field-effect transistor
title_short Two-dimensional modeling the static parameters for a submicron field-effect transistor
title_full Two-dimensional modeling the static parameters for a submicron field-effect transistor
title_fullStr Two-dimensional modeling the static parameters for a submicron field-effect transistor
title_full_unstemmed Two-dimensional modeling the static parameters for a submicron field-effect transistor
title_sort two-dimensional modeling the static parameters for a submicron field-effect transistor
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2009
url http://dspace.nbuv.gov.ua/handle/123456789/118847
citation_txt Two-dimensional modeling the static parameters for a submicron field-effect transistor / M. Zaabat, M. Draid // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 4. — С. 417-420. — Бібліогр.: 10 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT zaabatm twodimensionalmodelingthestaticparametersforasubmicronfieldeffecttransistor
AT draidm twodimensionalmodelingthestaticparametersforasubmicronfieldeffecttransistor
first_indexed 2023-10-18T20:33:08Z
last_indexed 2023-10-18T20:33:08Z
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