Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures

The work deals with study and optimization of the technological parameters of ohmic contacts for HEMTs. It is shown that the depth of fusion front penetration into semiconductor is the main factor that determines ohmic properties of contact junctions.

Збережено в:
Бібліографічні деталі
Дата:2002
Автори: Konakova, R.V., Milenin, V.V., Stovpovoi, M.A.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2002
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/121191
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures / R.V. Konakova, V.V. Milenin, M.A. Stovpovoi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 2. — С. 180-182. — Бібліогр.: 9 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1211912017-06-14T03:07:20Z Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures Konakova, R.V. Milenin, V.V. Stovpovoi, M.A. The work deals with study and optimization of the technological parameters of ohmic contacts for HEMTs. It is shown that the depth of fusion front penetration into semiconductor is the main factor that determines ohmic properties of contact junctions. 2002 Article Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures / R.V. Konakova, V.V. Milenin, M.A. Stovpovoi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 2. — С. 180-182. — Бібліогр.: 9 назв. — англ. 1560-8034 PACS: 73.40.K, 73.40.C http://dspace.nbuv.gov.ua/handle/123456789/121191 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The work deals with study and optimization of the technological parameters of ohmic contacts for HEMTs. It is shown that the depth of fusion front penetration into semiconductor is the main factor that determines ohmic properties of contact junctions.
format Article
author Konakova, R.V.
Milenin, V.V.
Stovpovoi, M.A.
spellingShingle Konakova, R.V.
Milenin, V.V.
Stovpovoi, M.A.
Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Konakova, R.V.
Milenin, V.V.
Stovpovoi, M.A.
author_sort Konakova, R.V.
title Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures
title_short Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures
title_full Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures
title_fullStr Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures
title_full_unstemmed Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures
title_sort optimization of technological parameters of ohmic contact junctions for gaas-algaas-based transistor structures
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2002
url http://dspace.nbuv.gov.ua/handle/123456789/121191
citation_txt Optimization of technological parameters of ohmic contact junctions for GaAs-AlGaAs-based transistor structures / R.V. Konakova, V.V. Milenin, M.A. Stovpovoi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 2. — С. 180-182. — Бібліогр.: 9 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT konakovarv optimizationoftechnologicalparametersofohmiccontactjunctionsforgaasalgaasbasedtransistorstructures
AT mileninvv optimizationoftechnologicalparametersofohmiccontactjunctionsforgaasalgaasbasedtransistorstructures
AT stovpovoima optimizationoftechnologicalparametersofohmiccontactjunctionsforgaasalgaasbasedtransistorstructures
first_indexed 2023-10-18T20:38:51Z
last_indexed 2023-10-18T20:38:51Z
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