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Growth and structure of WC/Si multilayer x-ray mirror

Growth and structure of WC/Si multilayer x-ray mirror

WC/Si multilayer X-ray mirrors (MXMs) with nominal layers thicknesses of 0.2…30.3 nm (periods: 0.7…38.9 nm) were deposited by direct current magnetron sputtering and studied by X-ray diffraction and cross-sectional transmission electron microscopy (TEM). Carbide and silicon layers are amorphous thro...

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Bibliographic Details
Main Authors: Pershyn, Y.P., Chumak, V.S., Shypkova, I.G., Mamon, V.V., Devizenko, A.Yu., Kondratenko, V.V., Reshetnyak, M.V., Zubarev, E.N.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2018
Series:Вопросы атомной науки и техники
Subjects:
Физика и технология конструкционных материалов
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/137337
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http://dspace.nbuv.gov.ua/handle/123456789/137337

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