Structure and mechanical stresses in TaSi₂/Si multilayer

The structure, construction and mechanical stresses of the TaSi₂/Si multilayer manufactured by magnetron sputtering on the heated substrates were studied in the initial state and after thermal annealing. Deposition of multilayers is accompanied by formation of compressive mechanical stress. Reductio...

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Збережено в:
Бібліографічні деталі
Дата:2018
Автори: Devizenko, A.Yu., Kopylets, I.A., Kondratenko, V.V., Pershyn, Y.P., Devizenko, I.Y., Zubarev, E.N., Savitskiy, B.A.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2018
Назва видання:Functional Materials
Теми:
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/157428
Теги: Додати тег
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Structure and mechanical stresses in TaSi₂/Si multilayer / A.Yu. Devizenko, I.A. Kopylets, V.V. Kondratenko, Y.P. Pershyn, I.Y. Devizenko, E.N. Zubarev, B.A. Savitskiy // Functional Materials. — 2018. — Т. 25, № 4. — С. 729-735. — Бібліогр.: 12 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Опис
Резюме:The structure, construction and mechanical stresses of the TaSi₂/Si multilayer manufactured by magnetron sputtering on the heated substrates were studied in the initial state and after thermal annealing. Deposition of multilayers is accompanied by formation of compressive mechanical stress. Reduction of mechanical stresses in the multilayers by increasing of the substrate temperature and after thermal annealing was observed. The thickness of the multilayers and the annealing temperature at which ones separated from the substrate were shown. Thermal annealing is accompanied by changes of the multilayer construction and structure of layers. The deposition of depth graded multilayers with layer thickness distribution according to the Fresnel zone plate law has been performed.