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Optical and mass spectra from reactive plasma at magnetron deposition of tantalum oxynitride

Processes in reactive plasma during the magnetron deposition of tantalum oxynitride with ICP activation of reactive gas are studied in dependence on Oxygen fraction. Results of spectroscopic study of optical emission from the plasma and of mass-spectrometry of gas composition in the vacuum chamber i...

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Bibliographic Details
Main Authors: Dudin, S., Yakovin, S., Zykov, A., Yefymenko, N.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
Series:Вопросы атомной науки и техники
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Online Access:http://dspace.nbuv.gov.ua/handle/123456789/194770
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