Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system

• Дата: 2022
• Автори: Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A., Kozhukhovskyi, B.M.
• Формат: Стаття
• Мова: English
• Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2022
• Назва видання: Problems of Atomic Science and Technology
• Теми: Low temperature plasma and plasma technologies
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/195896
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, V.A. Makhlai, B.M. Kozhukhovskyi // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 103-106. — Бібліогр.: 6 назв. — англ.

Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the a...