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Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system

Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system

Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the a...

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Bibliographic Details
Main Authors: Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A., Kozhukhovskyi, B.M.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2022
Series:Problems of Atomic Science and Technology
Subjects:
Low temperature plasma and plasma technologies
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/195896
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http://dspace.nbuv.gov.ua/handle/123456789/195896

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