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Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system
Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the a...
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Main Authors: | Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A., Kozhukhovskyi, B.M. |
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Format: | Article |
Language: | English |
Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2022
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Series: | Problems of Atomic Science and Technology |
Subjects: | |
Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/195896 |
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