Large-area surface wave plasma source

Large-area surface wave plasma source

A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the sourc...

Повний опис

Збережено в:
Бібліографічні деталі
Дата:2002
Автори: Azarenkov, N.A., Bizyukov, A.A., Sereda, K.N., Tseluyko, A.Ph., Yunakov, N.N., Gapon, A.V., Kashaba, A.Y.
Формат: Стаття
Мова:English
Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
Назва видання:Вопросы атомной науки и техники
Теми:
Low temperature plasma and plasma technologies
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/79286
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-79286
record_format dspace
spelling irk-123456789-792862015-03-31T03:02:50Z Large-area surface wave plasma source Azarenkov, N.A. Bizyukov, A.A. Sereda, K.N. Tseluyko, A.Ph. Yunakov, N.N. Gapon, A.V. Kashaba, A.Y. Low temperature plasma and plasma technologies A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the source. The pumping-out of the source is carried out through the insulated substrate holder. The plasma source operates in a working gas pressure range of 3∙10⁻² ÷ 10⁻⁴ Torr with changing the RF power in a range of 50÷1000 W during the discharge on surface waves with the mode 0 excited by a ring antenna. The plasma density has a homogeneous distribution over a diameter of 300 mm and varies in a range of 10⁸÷10¹⁰ cm⁻³ at electron temperature of 2÷7 eV depending on external parameters. An ion beam density in the presence of the RF bias applied to the substrate holder reached 0.1 mA/сm² with homogeneous distribution over the diameter of 300 mm. The total ion current to the substrate holder with a diameter of 467 mm reaches the value of 2 A with average ion energy of 200 eV. Numerical analysis of electric field distribution over the processing chamber in linear approach was made and compared to experimental results obtained. 2002 Article Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ. 1562-6016 PACS: 52.50.Dg http://dspace.nbuv.gov.ua/handle/123456789/79286 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
topic Low temperature plasma and plasma technologies
Low temperature plasma and plasma technologies
spellingShingle Low temperature plasma and plasma technologies
Low temperature plasma and plasma technologies
Azarenkov, N.A.
Bizyukov, A.A.
Sereda, K.N.
Tseluyko, A.Ph.
Yunakov, N.N.
Gapon, A.V.
Kashaba, A.Y.
Large-area surface wave plasma source
Вопросы атомной науки и техники
description A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the source. The pumping-out of the source is carried out through the insulated substrate holder. The plasma source operates in a working gas pressure range of 3∙10⁻² ÷ 10⁻⁴ Torr with changing the RF power in a range of 50÷1000 W during the discharge on surface waves with the mode 0 excited by a ring antenna. The plasma density has a homogeneous distribution over a diameter of 300 mm and varies in a range of 10⁸÷10¹⁰ cm⁻³ at electron temperature of 2÷7 eV depending on external parameters. An ion beam density in the presence of the RF bias applied to the substrate holder reached 0.1 mA/сm² with homogeneous distribution over the diameter of 300 mm. The total ion current to the substrate holder with a diameter of 467 mm reaches the value of 2 A with average ion energy of 200 eV. Numerical analysis of electric field distribution over the processing chamber in linear approach was made and compared to experimental results obtained.
format Article
author Azarenkov, N.A.
Bizyukov, A.A.
Sereda, K.N.
Tseluyko, A.Ph.
Yunakov, N.N.
Gapon, A.V.
Kashaba, A.Y.
author_facet Azarenkov, N.A.
Bizyukov, A.A.
Sereda, K.N.
Tseluyko, A.Ph.
Yunakov, N.N.
Gapon, A.V.
Kashaba, A.Y.
author_sort Azarenkov, N.A.
title Large-area surface wave plasma source
title_short Large-area surface wave plasma source
title_full Large-area surface wave plasma source
title_fullStr Large-area surface wave plasma source
title_full_unstemmed Large-area surface wave plasma source
title_sort large-area surface wave plasma source
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
publishDate 2002
topic_facet Low temperature plasma and plasma technologies
url http://dspace.nbuv.gov.ua/handle/123456789/79286
citation_txt Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ.
series Вопросы атомной науки и техники
work_keys_str_mv AT azarenkovna largeareasurfacewaveplasmasource
AT bizyukovaa largeareasurfacewaveplasmasource
AT seredakn largeareasurfacewaveplasmasource
AT tseluykoaph largeareasurfacewaveplasmasource
AT yunakovnn largeareasurfacewaveplasmasource
AT gaponav largeareasurfacewaveplasmasource
AT kashabaay largeareasurfacewaveplasmasource
first_indexed 2023-10-18T19:18:21Z
last_indexed 2023-10-18T19:18:21Z
_version_ 1796146556036972544

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