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Optimization of the collecting mirror location in the plasma source of extreme ultraviolet radiation
The paper is devoted to searching the optimal location of first collecting mirror in the extreme ultraviolet radiation plasma sources. It is shown that the system efficiency can be increased by 1.5…2.5 times in the case of elliptical plasma radiation pattern and the optimal location of the first col...
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Main Authors: | , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2015
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Series: | Вопросы атомной науки и техники |
Subjects: | |
Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/82144 |
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