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Optimization of the collecting mirror location in the plasma source of extreme ultraviolet radiation

The paper is devoted to searching the optimal location of first collecting mirror in the extreme ultraviolet radiation plasma sources. It is shown that the system efficiency can be increased by 1.5…2.5 times in the case of elliptical plasma radiation pattern and the optimal location of the first col...

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Bibliographic Details
Main Authors: Borgun, Ie.V., Hrechko, Ya.O., Azarenkov, N.A., Dimitrova, V.D., Ryabchikov, D.L., Sereda, I.N., Hryhorenko, A.V., Tseluyko, A.F.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2015
Series:Вопросы атомной науки и техники
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Online Access:http://dspace.nbuv.gov.ua/handle/123456789/82144
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Summary:The paper is devoted to searching the optimal location of first collecting mirror in the extreme ultraviolet radiation plasma sources. It is shown that the system efficiency can be increased by 1.5…2.5 times in the case of elliptical plasma radiation pattern and the optimal location of the first collecting mirror. In this case the first collecting mirror should cover the plasma on lateral side.