Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals

It has been shown that a result of InSe crystal oxidation is formation of an
 intrinsic oxide film that has not insulating but conductive properties. This conductive
 film forms a potential barrier with the semiconductor substrate. Sheet resistance
 measurements of the InSe o...

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Збережено в:
Бібліографічні деталі
Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2011
Автори: Katerynchuk, V.M., Kovalyuk, Z.D.
Формат: Стаття
Мова:Англійська
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/117651
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals / V.M. Katerynchuk, Z.D. Kovalyuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 106-108. — Бібліогр.: 4 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Katerynchuk, V.M.
Kovalyuk, Z.D.
author_facet Katerynchuk, V.M.
Kovalyuk, Z.D.
citation_txt Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals / V.M. Katerynchuk, Z.D. Kovalyuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 106-108. — Бібліогр.: 4 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description It has been shown that a result of InSe crystal oxidation is formation of an
 intrinsic oxide film that has not insulating but conductive properties. This conductive
 film forms a potential barrier with the semiconductor substrate. Sheet resistance
 measurements of the InSe oxide film in dependence on the oxidation time under various
 temperature conditions were carried out. The resistance was also tested for oxide films
 obtained for two mutually orthogonal crystal faces: perpendicular and parallel to the с
 axis. It has been established that the film sheet resistance is substantially changed only
 for 5 min of the oxidation time, and further oxidation does not affect its value that is
 about 100-150 Ohm/square. Surface topology of InSe intrinsic oxide was studied using
 the atomic-force microscopy method. It was found that this surface becomes
 nanostructured and contains nanoneedles oriented perpendicularly to the plane of sample
 surface. Dynamics of surface topology changes in dependence on temperature-time
 conditions of the oxidation process has been ascertained. It manifests itself in a change of
 lateral and vertical dimensions of nanoneedles as well as their density.
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language English
last_indexed 2025-12-07T18:16:22Z
publishDate 2011
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Katerynchuk, V.M.
Kovalyuk, Z.D.
2017-05-25T18:35:15Z
2017-05-25T18:35:15Z
2011
Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals / V.M. Katerynchuk, Z.D. Kovalyuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 106-108. — Бібліогр.: 4 назв. — англ.
1560-8034
PACS 73.25.+i, 73.61.-r, 81.16.Rf
https://nasplib.isofts.kiev.ua/handle/123456789/117651
It has been shown that a result of InSe crystal oxidation is formation of an
 intrinsic oxide film that has not insulating but conductive properties. This conductive
 film forms a potential barrier with the semiconductor substrate. Sheet resistance
 measurements of the InSe oxide film in dependence on the oxidation time under various
 temperature conditions were carried out. The resistance was also tested for oxide films
 obtained for two mutually orthogonal crystal faces: perpendicular and parallel to the с
 axis. It has been established that the film sheet resistance is substantially changed only
 for 5 min of the oxidation time, and further oxidation does not affect its value that is
 about 100-150 Ohm/square. Surface topology of InSe intrinsic oxide was studied using
 the atomic-force microscopy method. It was found that this surface becomes
 nanostructured and contains nanoneedles oriented perpendicularly to the plane of sample
 surface. Dynamics of surface topology changes in dependence on temperature-time
 conditions of the oxidation process has been ascertained. It manifests itself in a change of
 lateral and vertical dimensions of nanoneedles as well as their density.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
Article
published earlier
spellingShingle Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
Katerynchuk, V.M.
Kovalyuk, Z.D.
title Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
title_full Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
title_fullStr Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
title_full_unstemmed Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
title_short Sheet resistance and surface topology time dynamics of intrinsic oxide film on InSe crystals
title_sort sheet resistance and surface topology time dynamics of intrinsic oxide film on inse crystals
url https://nasplib.isofts.kiev.ua/handle/123456789/117651
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