Revision of interface coupling in ultra-thin body silicon-on-insulator MOSFETs
The charge coupling between the gate and substrate is a fundamental property of any fully-depleted silicon-on-insulator (SOI) MOS transistor, which manifests itself as a dependence of electrical characteristics at one Si film/dielectric interface on charges at the opposite interface and opposite...
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| Published in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Date: | 2013 |
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2013
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/117737 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Revision of interface coupling in ultra-thin body silicon-on-insulator MOSFETs / T. Rudenko, A. Nazarov, V. Kilchytska, D. Flandre, V. Popov, M. Ilnitsky, and V. Lysenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 3. — С. 300-309. — Бібліогр.: 23 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| Summary: | The charge coupling between the gate and substrate is a fundamental property
of any fully-depleted silicon-on-insulator (SOI) MOS transistor, which manifests itself as
a dependence of electrical characteristics at one Si film/dielectric interface on charges at
the opposite interface and opposite gate bias. Traditionally, gate-to-substrate coupling in
SOI MOS transistors is described by the classical Lim-Fossum model. However, in the
case of SOI MOS transistors with ultra-thin silicon bodies, significant deviations from
this model are observed. In this paper, the behavior of gate coupling in SOI MOS
structures with ultra-thin silicon films and ultra-thin gate dielectrics is studied and
analyzed using experimental data and one-dimensional numerical simulations in classical
and quantum-mechanical modes. It is shown that in these advanced transistor structures,
coupling characteristics (dependences of the front- and back-gate threshold voltages on
the opposite gate bias) feature a larger slope and much wider (more than doubled) linear
region than that predicted by the Lim-Fossum model. These differences originate from
both electrostatic and quantization effects. A simple analytical model taking into account
these effects and being in good agreement with numerical simulations and experimental
results is proposed.
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| ISSN: | 1560-8034 |