Influence of small miscuts on self-ordered growth of Ge nanoislands

Using high-resolution X-ray diffraction (HRXRD), we have investigated
 lateral ordering the nanoislands formed from Ge wetting layer of various thicknesses
 deposited on a strained Si₁₋xGex sublayer. We observed that the high lateral ordering
 degree is initiated by ordered m...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2011
Hauptverfasser: Gudymenko, O.Yo., Kladko, V.P., Yefanov, O.M., Slobodian, M.V., Polischuk, Yu.S., Krasilnik, Z.F., Lobanov, D.V., Novikov, А.А.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/117796
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Zitieren:Influence of small miscuts on self-ordered growth of Ge nanoislands / O.Yo. Gudymenko, V.P. Kladko, O.M. Yefanov, M.V. Slobodian, Yu.S.Polischuk, Z.F. Krasilnik, D.V. Lobanov, А.А. Novikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 389-392. — Бібліогр.: 18 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Gudymenko, O.Yo.
Kladko, V.P.
Yefanov, O.M.
Slobodian, M.V.
Polischuk, Yu.S.
Krasilnik, Z.F.
Lobanov, D.V.
Novikov, А.А.
author_facet Gudymenko, O.Yo.
Kladko, V.P.
Yefanov, O.M.
Slobodian, M.V.
Polischuk, Yu.S.
Krasilnik, Z.F.
Lobanov, D.V.
Novikov, А.А.
citation_txt Influence of small miscuts on self-ordered growth of Ge nanoislands / O.Yo. Gudymenko, V.P. Kladko, O.M. Yefanov, M.V. Slobodian, Yu.S.Polischuk, Z.F. Krasilnik, D.V. Lobanov, А.А. Novikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 389-392. — Бібліогр.: 18 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Using high-resolution X-ray diffraction (HRXRD), we have investigated
 lateral ordering the nanoislands formed from Ge wetting layer of various thicknesses
 deposited on a strained Si₁₋xGex sublayer. We observed that the high lateral ordering
 degree is initiated by ordered modulation of non-uniform deformation fields. This
 modulation is induced by small (∼0.3°) misorientation of Si substrate from [001]
 direction. Finally, we show that the miscut can be the source of perfectly ordered
 nanoisland arrays in two dimensions when the growth is performed on the strained SiGe
 (001) sublayer. The effect of substrate miscut can be amplified tuning the deviation of
 buffer layer surface from [001] growth direction via increasing the Ge content.
first_indexed 2025-11-24T04:19:36Z
format Article
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id nasplib_isofts_kiev_ua-123456789-117796
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-24T04:19:36Z
publishDate 2011
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Gudymenko, O.Yo.
Kladko, V.P.
Yefanov, O.M.
Slobodian, M.V.
Polischuk, Yu.S.
Krasilnik, Z.F.
Lobanov, D.V.
Novikov, А.А.
2017-05-26T17:45:36Z
2017-05-26T17:45:36Z
2011
Influence of small miscuts on self-ordered growth of Ge nanoislands / O.Yo. Gudymenko, V.P. Kladko, O.M. Yefanov, M.V. Slobodian, Yu.S.Polischuk, Z.F. Krasilnik, D.V. Lobanov, А.А. Novikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 389-392. — Бібліогр.: 18 назв. — англ.
1560-8034
PACS 68.37.Ef, 81.07.Ta, 81.16.Rf
https://nasplib.isofts.kiev.ua/handle/123456789/117796
Using high-resolution X-ray diffraction (HRXRD), we have investigated
 lateral ordering the nanoislands formed from Ge wetting layer of various thicknesses
 deposited on a strained Si₁₋xGex sublayer. We observed that the high lateral ordering
 degree is initiated by ordered modulation of non-uniform deformation fields. This
 modulation is induced by small (∼0.3°) misorientation of Si substrate from [001]
 direction. Finally, we show that the miscut can be the source of perfectly ordered
 nanoisland arrays in two dimensions when the growth is performed on the strained SiGe
 (001) sublayer. The effect of substrate miscut can be amplified tuning the deviation of
 buffer layer surface from [001] growth direction via increasing the Ge content.
The authors acknowledge the financial support of
 the National Academy of Sciences of Ukraine (projects
 No 3.5.1.12, No 3.5.1.30) and State Agency for Science,
 Innovation and Informatization of Ukraine (project
 M/ 212 − 2011).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Influence of small miscuts on self-ordered growth of Ge nanoislands
Article
published earlier
spellingShingle Influence of small miscuts on self-ordered growth of Ge nanoislands
Gudymenko, O.Yo.
Kladko, V.P.
Yefanov, O.M.
Slobodian, M.V.
Polischuk, Yu.S.
Krasilnik, Z.F.
Lobanov, D.V.
Novikov, А.А.
title Influence of small miscuts on self-ordered growth of Ge nanoislands
title_full Influence of small miscuts on self-ordered growth of Ge nanoislands
title_fullStr Influence of small miscuts on self-ordered growth of Ge nanoislands
title_full_unstemmed Influence of small miscuts on self-ordered growth of Ge nanoislands
title_short Influence of small miscuts on self-ordered growth of Ge nanoislands
title_sort influence of small miscuts on self-ordered growth of ge nanoislands
url https://nasplib.isofts.kiev.ua/handle/123456789/117796
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