Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons

We have studied the high-resistance samples of p-Si (р00 = (3.3 ± 0.5) ×
 × 10¹² cm⁻³
 ) and n-Si (n₀ = (2.0 ± 0.3) × 10¹² cm⁻³
 ) grown by the floating-zone technique
 after the irradiation by fast-pile neutrons at 287 К. The dose and the temperature
 depende...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2007
Main Authors: Dolgolenko, A.P., Varentsov, M.D., Gaidar, G.P., Litovchenko, P.G.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118342
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Cite this:Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons / A.P. Dolgolenko, M.D. Varentsov, G.P. Gaidar, P.G. Litovchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 9-14. — Бібліогр.: 11 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Dolgolenko, A.P.
Varentsov, M.D.
Gaidar, G.P.
Litovchenko, P.G.
author_facet Dolgolenko, A.P.
Varentsov, M.D.
Gaidar, G.P.
Litovchenko, P.G.
citation_txt Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons / A.P. Dolgolenko, M.D. Varentsov, G.P. Gaidar, P.G. Litovchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 9-14. — Бібліогр.: 11 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description We have studied the high-resistance samples of p-Si (р00 = (3.3 ± 0.5) ×
 × 10¹² cm⁻³
 ) and n-Si (n₀ = (2.0 ± 0.3) × 10¹² cm⁻³
 ) grown by the floating-zone technique
 after the irradiation by fast-pile neutrons at 287 К. The dose and the temperature
 dependences of the effective concentration of carriers have been measured. The
 calculation has been carried out in the framework of Gossick's corrected model. It is
 shown that the radiation hardness of n- and p-Si, on the one hand, is defined by clusters,
 and, on the other hand, by vacancy defects (acceptors) in n-Si and by interstitial defects
 (donors and acceptors) in p-Si. We have determined that, during the irradiation of p-Si by
 small doses of neutrons, the change of a charge state of interstitial defects leads to the
 annealing of these defects and to a decrease of their introduction rate.
first_indexed 2025-11-26T01:42:45Z
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-26T01:42:45Z
publishDate 2007
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Dolgolenko, A.P.
Varentsov, M.D.
Gaidar, G.P.
Litovchenko, P.G.
2017-05-29T19:37:10Z
2017-05-29T19:37:10Z
2007
Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons / A.P. Dolgolenko, M.D. Varentsov, G.P. Gaidar, P.G. Litovchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 9-14. — Бібліогр.: 11 назв. — англ.
1560-8034
PACS 61.72.Ji, 61.80.Hg, 61.82.Fk, 71.55.Cn
https://nasplib.isofts.kiev.ua/handle/123456789/118342
We have studied the high-resistance samples of p-Si (р00 = (3.3 ± 0.5) ×
 × 10¹² cm⁻³
 ) and n-Si (n₀ = (2.0 ± 0.3) × 10¹² cm⁻³
 ) grown by the floating-zone technique
 after the irradiation by fast-pile neutrons at 287 К. The dose and the temperature
 dependences of the effective concentration of carriers have been measured. The
 calculation has been carried out in the framework of Gossick's corrected model. It is
 shown that the radiation hardness of n- and p-Si, on the one hand, is defined by clusters,
 and, on the other hand, by vacancy defects (acceptors) in n-Si and by interstitial defects
 (donors and acceptors) in p-Si. We have determined that, during the irradiation of p-Si by
 small doses of neutrons, the change of a charge state of interstitial defects leads to the
 annealing of these defects and to a decrease of their introduction rate.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
Article
published earlier
spellingShingle Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
Dolgolenko, A.P.
Varentsov, M.D.
Gaidar, G.P.
Litovchenko, P.G.
title Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
title_full Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
title_fullStr Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
title_full_unstemmed Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
title_short Dependence of the defect introduction rate on the dose of irradiation of p-Si by fast-pile neutrons
title_sort dependence of the defect introduction rate on the dose of irradiation of p-si by fast-pile neutrons
url https://nasplib.isofts.kiev.ua/handle/123456789/118342
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AT varentsovmd dependenceofthedefectintroductionrateonthedoseofirradiationofpsibyfastpileneutrons
AT gaidargp dependenceofthedefectintroductionrateonthedoseofirradiationofpsibyfastpileneutrons
AT litovchenkopg dependenceofthedefectintroductionrateonthedoseofirradiationofpsibyfastpileneutrons