Indium induced nanostructures on In₄Se₃(100) surface studied by scanning tunneling microscopy

Indium deposition leads to changes in the scanning tunneling microscopy (STM)-revealed (100) surface morphology of In₄Se₃ layered semiconductor with the formation of nanostructures, which are characterized by different dimensionality dependent on different crystal growth conditions. Preferable forma...

Full description

Saved in:
Bibliographic Details
Published in:Functional Materials
Date:2013
Main Authors: Galiy, P.V., Nenchuk, T.M., Ciszewski, A., Mazur, P., Zuber, S., Buzhuk, Ya.M.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2013
Subjects:
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/119784
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Indium induced nanostructures on In₄Se₃(100) surface studied by scanning tunneling microscopy / P.V. Galiy, T.M. Nenchuk, A. Ciszewski, P. Mazur, S. Zuber, Ya.M. Buzhuk // Functional Materials. — 2013. — Т. 20, № 1. — С. 37-43. — Бібліогр.: 17 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
Description
Summary:Indium deposition leads to changes in the scanning tunneling microscopy (STM)-revealed (100) surface morphology of In₄Se₃ layered semiconductor with the formation of nanostructures, which are characterized by different dimensionality dependent on different crystal growth conditions. Preferable formation of nanodots in low and quasi one dimensional (1D) structures for the high bulk-conductivity crystals has been observed. The STM and scanning tunneling spectroscopy data enable us to consider that the dimensionality, shape and direction of the obtained indium deposition structures are induced by indium clusters available on the original, on-the-lattice-scale furrowed, ultra high vacuum (UHV) (100) cleavages of In₄Se₃ crystal due to the self-intercalation phenomenon.
ISSN:1027-5495