Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals

The current transport through insulating SiO₂ films with silicon nanocrystals in Si/SiO₂(Si)/Al structures has been investigated in the wide range of temperatures (82…350 K). The nanocomposite SiO₂(Si) films containing the silicon nanoclusters embedded into insulating SiO₂ matrix have been obtained...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2016
Main Authors: Bratus, O.L., Evtukh, A.A., Steblova, O.V., Prokopchuk, V.M.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/121517
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals / O.L. Bratus, A.A. Evtukh, O.V. Steblova, V.M. Prokopchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 9-13. — Бібліогр.: 11 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121517
record_format dspace
spelling Bratus, O.L.
Evtukh, A.A.
Steblova, O.V.
Prokopchuk, V.M.
2017-06-14T15:11:13Z
2017-06-14T15:11:13Z
2016
Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals / O.L. Bratus, A.A. Evtukh, O.V. Steblova, V.M. Prokopchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 9-13. — Бібліогр.: 11 назв. — англ.
1560-8034
DOI: 10.15407/spqeo19.01.009
PACS 72.20.Ее, 73.63.Bd
https://nasplib.isofts.kiev.ua/handle/123456789/121517
The current transport through insulating SiO₂ films with silicon nanocrystals in Si/SiO₂(Si)/Al structures has been investigated in the wide range of temperatures (82…350 K). The nanocomposite SiO₂(Si) films containing the silicon nanoclusters embedded into insulating SiO₂ matrix have been obtained by ion-plasma sputtering of silicon target and subsequent high-temperature annealing. Based on the detailed analysis of current-voltage characteristics, calculation of some electrical parameters has been performed and the mechanism of electron conductivity of nanocomposite SiO₂(Si) films has been ascertained. The electrical conductivity of the films is based on the mechanism of hopping conductivity with variable-range hopping through the traps near the Fermi level.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
spellingShingle Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
Bratus, O.L.
Evtukh, A.A.
Steblova, O.V.
Prokopchuk, V.M.
title_short Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
title_full Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
title_fullStr Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
title_full_unstemmed Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals
title_sort electron transport through nanocomposite sio₂(si) films containing si nanocrystals
author Bratus, O.L.
Evtukh, A.A.
Steblova, O.V.
Prokopchuk, V.M.
author_facet Bratus, O.L.
Evtukh, A.A.
Steblova, O.V.
Prokopchuk, V.M.
publishDate 2016
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The current transport through insulating SiO₂ films with silicon nanocrystals in Si/SiO₂(Si)/Al structures has been investigated in the wide range of temperatures (82…350 K). The nanocomposite SiO₂(Si) films containing the silicon nanoclusters embedded into insulating SiO₂ matrix have been obtained by ion-plasma sputtering of silicon target and subsequent high-temperature annealing. Based on the detailed analysis of current-voltage characteristics, calculation of some electrical parameters has been performed and the mechanism of electron conductivity of nanocomposite SiO₂(Si) films has been ascertained. The electrical conductivity of the films is based on the mechanism of hopping conductivity with variable-range hopping through the traps near the Fermi level.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121517
citation_txt Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals / O.L. Bratus, A.A. Evtukh, O.V. Steblova, V.M. Prokopchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 9-13. — Бібліогр.: 11 назв. — англ.
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AT steblovaov electrontransportthroughnanocompositesio2sifilmscontainingsinanocrystals
AT prokopchukvm electrontransportthroughnanocompositesio2sifilmscontainingsinanocrystals
first_indexed 2025-11-27T22:35:49Z
last_indexed 2025-11-27T22:35:49Z
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