Вплив тиску аргону в камерi осадження на властивостi легованих алюмiнiєм плiвок ZnO, вирощених методом пошарового осадження при магнетронному розпиленнi

ZnO:Al films are deposited layer-by-layer onto silicon and glass substrates, by using the radio-frequency magnetron sputtering method at various argon pressures from 0.5 to 2 Pa in a deposition chamber. The influence of this pressure on the structure and the optical and electrical properties of ZnO:...

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Bibliographic Details
Date:2019
Main Authors: Popovych, V. I., Ievtushenko, A. I., Lytvyn, O. S., Romanjuk, V. R., Tkach, V. M., Baturyn, V. A., Karpenko, O. Y., Dranchuk, M. V., Klochkov, L. O., Dushejko, M. G., Karpyna, V. A., Lashkarov, G. V.
Format: Article
Language:English
Ukrainian
Published: Publishing house "Academperiodika" 2019
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Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019095
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Journal Title:Ukrainian Journal of Physics

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Ukrainian Journal of Physics