Doping the thin films by using the original Close Space Sublimation method von Khomchenko, V.S., Sopinskyy, M.V., Dan'ko, V.A., Olkhovik, G.P.

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Nickel-induced enhancement of photoluminescence in nc-Si–SiOx nanostructures von Michailovska, K.V., Indutnyi, I.Z., Shepeliavyi, P.E., Dan’ko, V.A.

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Optical study of thermally induced phase separation in evaporated SiOx films von Indutnyy, I.Z., Lisovskyy, I.P., Mazunov, D.O., Shepeliavyi, P.E., Rudko, G.Yu., Dan'ko, V.A.

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Photostimulated etching of germanium chalcogenide films von Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Shepeliavyi, P.E., Lukyanyuk, M.V., Litvin, O.S.

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Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation von Dan'ko, V.A., Indutnyi, I.Z., Myn'ko, V.I., Mamykin, S.V., Shepeliavyi, P.Ye., Lukaniuk, M.V., Lytvyn, P.M.

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Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films von Indutnyy, I.Z., Lysenko, V.S., Min'ko, V.I., Nazarov, A.N., Tkachenko, A.S., Shepeliavyi, P.E., Dan'ko, V.A., Maidanchuk, I.Yu.

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Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist von Dan’ko, V.A., Dorozinsky, G.V., Indutnyi, I.Z., Myn’ko, V.I., Ushenin, Yu.V., Shepeliavyi, P.E., Lukaniuk, M.V., Korchovyi, A.A., Khrystosenko, R.V.

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