Doping the thin films by using the original Close Space Sublimation method by Khomchenko, V.S., Sopinskyy, M.V., Dan'ko, V.A., Olkhovik, G.P.

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Nickel-induced enhancement of photoluminescence in nc-Si–SiOx nanostructures by Michailovska, K.V., Indutnyi, I.Z., Shepeliavyi, P.E., Dan’ko, V.A.

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Optical study of thermally induced phase separation in evaporated SiOx films by Indutnyy, I.Z., Lisovskyy, I.P., Mazunov, D.O., Shepeliavyi, P.E., Rudko, G.Yu., Dan'ko, V.A.

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Photostimulated etching of germanium chalcogenide films by Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Shepeliavyi, P.E., Lukyanyuk, M.V., Litvin, O.S.

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Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation by Dan'ko, V.A., Indutnyi, I.Z., Myn'ko, V.I., Mamykin, S.V., Shepeliavyi, P.Ye., Lukaniuk, M.V., Lytvyn, P.M.

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Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films by Indutnyy, I.Z., Lysenko, V.S., Min'ko, V.I., Nazarov, A.N., Tkachenko, A.S., Shepeliavyi, P.E., Dan'ko, V.A., Maidanchuk, I.Yu.

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Formation of laterally ordered arrays of noble metal nanocavities for SERS substrates by using interference photolithography by Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Lytvyn, P.M., Lukaniuk, M.V., Bandarenka, H.V., Dolgyi, A.L., Redko, S.V.

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Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist by Dan’ko, V.A., Dorozinsky, G.V., Indutnyi, I.Z., Myn’ko, V.I., Ushenin, Yu.V., Shepeliavyi, P.E., Lukaniuk, M.V., Korchovyi, A.A., Khrystosenko, R.V.

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