Doping the thin films by using the original Close Space Sublimation method за авторством Khomchenko, V.S., Sopinskyy, M.V., Dan'ko, V.A., Olkhovik, G.P.

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Nickel-induced enhancement of photoluminescence in nc-Si–SiOx nanostructures за авторством Michailovska, K.V., Indutnyi, I.Z., Shepeliavyi, P.E., Dan’ko, V.A.

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The effect of surface plasmon-polaritons on the photostimulated diffusion in light-sensitive Ag–As₄Ge₃₀S₆₆ structures за авторством Indutnyi, I.Z., Mynko, V.I., Sopinskyy, M.V., Dan’ko, V.A., Lytvyn, P.M.

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Recording of high efficiency diffraction gratings by He-Ne laser за авторством Min'ko, V.I., Shepeliavyi, P.E., Dan'ko, V.A., Romanenko, P.F., Litvin, O.S., Indutnyy, I.Z.

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Optical study of thermally induced phase separation in evaporated SiOx films за авторством Indutnyy, I.Z., Lisovskyy, I.P., Mazunov, D.O., Shepeliavyi, P.E., Rudko, G.Yu., Dan'ko, V.A.

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Photostimulated etching of germanium chalcogenide films за авторством Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Shepeliavyi, P.E., Lukyanyuk, M.V., Litvin, O.S.

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Controlling the photoluminescence spectra of porous nc-Si–SiOx structures by vapor treatment за авторством Dan’ko, V.A., Bratus, V.Ya., Indutnyi, I.Z., Lisovskyy, I.P., Zlobin, S.O., Michailovska, K.V., Shepeliavyi, P.E.

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Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation за авторством Dan'ko, V.A., Indutnyi, I.Z., Myn'ko, V.I., Mamykin, S.V., Shepeliavyi, P.Ye., Lukaniuk, M.V., Lytvyn, P.M.

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Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films за авторством Indutnyy, I.Z., Lysenko, V.S., Min'ko, V.I., Nazarov, A.N., Tkachenko, A.S., Shepeliavyi, P.E., Dan'ko, V.A., Maidanchuk, I.Yu.

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Formation of laterally ordered arrays of noble metal nanocavities for SERS substrates by using interference photolithography за авторством Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Lytvyn, P.M., Lukaniuk, M.V., Bandarenka, H.V., Dolgyi, A.L., Redko, S.V.

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Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist за авторством Dan’ko, V.A., Dorozinsky, G.V., Indutnyi, I.Z., Myn’ko, V.I., Ushenin, Yu.V., Shepeliavyi, P.E., Lukaniuk, M.V., Korchovyi, A.A., Khrystosenko, R.V.

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