Search Results - Fomin, A.S.
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Modeling the process of removal aimed at cut traces on semiconductor wafers by using the method of contactless chemical-and-dynamical polishing by Pashchenko, G.A., Kravetskyi, M.Yu., Fomin, A.V.
Published in Semiconductor Physics Quantum Electronics & Optoelectronics (2015)Get full text
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The heat flow, thermal history of the oil source Lower Jurassic Togurskaya suite and oil-and-gas potential of the Paleozoic of the Koltogor mezodepression(southern segment of the K... by Lobova, G. A., Luneva, T. E., Isaev, V. I., Fomin, A. N., Korzhov, Ju. V., Galieva, M. F., Krutenko, D. S.
Published 2019
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