Харвестер відкритої науки НАН України

Investigation of the effect of technological parameters on efficiency of chemical string cutting of semiconductor materials

за авторством Kravetsky, M.Yu., Sypko, S.A., Fomin, A.V.
Опубліковано в: Semiconductor Physics Quantum Electronics & Optoelectronics (2002)

Modeling the process of removal aimed at cut traces on semiconductor wafers by using the method of contactless chemical-and-dynamical polishing

за авторством Pashchenko, G.A., Kravetskyi, M.Yu., Fomin, A.V.
Опубліковано в: Semiconductor Physics Quantum Electronics & Optoelectronics (2015)

Balance model for contactless chemo-mechanical polishing of wafers

за авторством Grigoriev, N.N., Kravetsky, M.Yu., Paschenko, G.A., Sypko, S.A., Fomin, A.V.
Опубліковано в: Semiconductor Physics Quantum Electronics & Optoelectronics (2002)