Спектроскопiчнi дослiдження плазми високочастотного розряду при плазмохiмiчному травленнi епiтаксiальних структур нiтриду галiю...

by Hladkovskiy, V. V., Fedorovich, O. A.
Published 2018

The qualitative analysis of the composition of the RF discharge plasma by means of mass-spectrometry

by Hladkovskiy, V.V., Polozov, B.P., Fedorovich, O.A.
Published 2016

The bias voltage and its influence on the etching rate of silicon

by Fedorovich, О.А., Hladkovskiy, V.V., Polozov, B.P., Kruglenko, М.P.
Published 2015

About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields

by Hladkovskiy, V.V., Fedorovich, O.A., Polozov, B.P., Kruglenko, M.P.
Published 2015