The qualitative analysis of the composition of the RF discharge plasma by means of mass-spectrometry by Hladkovskiy, V.V., Polozov, B.P., Fedorovich, O.A.

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The bias voltage and its influence on the etching rate of silicon by Fedorovich, О.А., Hladkovskiy, V.V., Polozov, B.P., Kruglenko, М.P.

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About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields by Hladkovskiy, V.V., Fedorovich, O.A., Polozov, B.P., Kruglenko, M.P.

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Влияние параметров ВЧ-разряда и параметров нагревателя на температуру подложки в плазмохимическом реакторе «Алмаз» для синтеза углеродных алмазоподобных пленок... by Hladkovskiy, V. V., Kostin, E. G., Polozov, B. P., Fedorovich, O. A., Petriakov, V. A.

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