The energy balance of the asymmetric combined inductive-capacitive RF discharge at low pressure

• Дата: 2003
• Автори: Zykov, A.V., Polozhiy, K.I., Farenik, V.I.
• Формат: Стаття
• Мова: English
• Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2003
• Назва видання: Вопросы атомной науки и техники
• Теми: Low temperature plasma and plasma technologies
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/110619
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: The energy balance of the asymmetric combined inductive-capacitive RF discharge at low pressure / A.V. Zykov, K.I. Polozhiy, V.I. Farenik // Вопросы атомной науки и техники. — 2003. — № 1. — С. 130-132. — Бібліогр.: 12 назв. — англ.

The combined inductive-capacitive RF discharge at low gas pressure is considered for a case of collisionless ion motion. The power distribution model in the combined RF discharge in case of two asymmetric RF electrodes is developed in term of a ratio of the electrode areas and in term of a magnitude of applied RF voltage. We believe that power distributes on three parts: ionization and acceleration of ions in two electrode-sheath transitions. Two types of design is considered: with one and two RF generators. The dependencies of the dissipated RF power parts are obtained in terms of external discharge parameters. It is revealed an existence of a power maximum on acceleration of ions at electrode, which has a lower area. Been accorded expression for dependence of optimum discharge parameters. At using the power distribution model results the system parameter correlation’s have been obtained for a maximum process effectiveness of physical sputtering for systems on the basis of combined inductive-capacitive discharge.