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Oxygen activation effect on reactive magnetron synthesis of alumina coatings
The investigation results of the DC magnetron sputtering system for synthesis of high-quality oxide coatings are presented. In the system oxygen, activated by an independent Inductively-Coupled Plasma (ICP) source, is introduced into an aluminum sputtering chamber as an alternative to conventional r...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2007
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/111311 |
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