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Investigations of physical mechanisms of metal-insulator transition in highly strained n-Si and n-Ge crystals

Investigations of physical mechanisms of metal-insulator transition in highly strained n-Si and n-Ge crystals

Analysis of experimental results on transport phenomena is presented for highly uniaxially strained silicon and germanium crystals heavily doped by shallow donors. Possible mechanisms of the strain induced metal-insulator (MI) transition determined by peculiarities of the c-band energy spectrum tran...

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Bibliographic Details
Main Authors: Budzulyak, S.I., Ermakov, V.M., Kyjak, B.R., Kolomoets, V.V., Machulin, V.F., Novoselets, M.K., Panasjuk, L.I., Sus', B.B., Venger, E.F.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
Series:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/117939
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http://dspace.nbuv.gov.ua/handle/123456789/117939

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