Peculiarities of injection phenomena in heavily doped silicon structures and development of radiation-resistant diode temperature sensors

• Дата: 2003
• Автори: Shwarts, Yu.M., Sokolov, V.N., Shwarts, M.M., Venger, E.F.
• Формат: Стаття
• Мова: English
• Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
• Назва видання: Semiconductor Physics Quantum Electronics & Optoelectronics
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/118002
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Peculiarities of injection phenomena in heavily doped silicon structures and development of radiation-resistant diode temperature sensors / Yu.M. Shwarts, V.N. Sokolov, M.M. Shwarts, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 2. — С. 233-237. — Бібліогр.: 6 назв. — англ.

To explain the experimental behaviour of differential characteristics (ideality factor, differential resistance) before and after radiation influence, a theoretical model of injection current flow mechanisms for the silicon diode temperature sensors (DTSs) is proposed. The observed nonmonotonic depe...