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Peculiarities of thermoannealing in n-Si and n-Ge crystals with oxygen impurity

. Investigated in this work were changes in the concentration of charge carriers ne and their mobilities u, which occur under the influence of thermoannealing of n - Si and n - Ge crystals grown by the Czochralski method. Thermoannealing of n - Si samples was carried out both at 450 °C and 650 °C...

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Bibliographic Details
Main Authors: Baranskii, P.I., Gaidar, G.P.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Series:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/118307
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