Formation and thermal stability of NiSi phase in Ni (30 nm)/Pt (2 nm; 6 nm)/Siep. (50 nm)/Si (001) thin film systems

• Main Authors: Makogon, Iu.N., Pavlova, E.P., Sidorenko, S.I., Beddies, G., Beke, D.L., Csik, A., Verbitska, T.I., Fihurna, E.V., Shkarban, R.A.
• Format: Article
• Language: English
• Published: НТК «Інститут монокристалів» НАН України 2013
• Series: Functional Materials
• Subjects: Characterization and properties
• Online Access: http://dspace.nbuv.gov.ua/handle/123456789/120090

The influence of Pt on solid state reactions in Ni (30 nm)/Pt(x) /Siep.(50 nm)/ Si (001) (x=2 nm, 6 nm) nanodimensional films has been investigated. The layers of Pt and Ni were produced by magnetron sputtering technique on the epitaxially grown 50 nm Si layer on the top of the monocryst...