Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and w...
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| Дата: | 2016 |
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| Автори: | , , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2016
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| Назва видання: | Functional Materials |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/120639 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
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dspace |
| spelling |
irk-123456789-1206392017-06-13T03:03:38Z Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film Oberemok, O.S. Sabov, T.M. Lisovskyy, I.P. Khacevych, I.M. Gudymenko, O.Yo. Nikirin, V.A. Voitovych, M.V. Technology Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and with the face centered cubic structure for the heated substrate. Surface morphology of films consists of nanocrystalline randomly oriented grains. Increasing of the deposition rate and/or the substrate temperature lead to decrease of the film porosity and enlarge of nanocrystals. The maximum oxidation state of the deposited films is observed near the surface. 2016 Article Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ. 1027-5495 DOI: dx.doi.org/10.15407/fm23.02.313 http://dspace.nbuv.gov.ua/handle/123456789/120639 en Functional Materials НТК «Інститут монокристалів» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Technology Technology |
| spellingShingle |
Technology Technology Oberemok, O.S. Sabov, T.M. Lisovskyy, I.P. Khacevych, I.M. Gudymenko, O.Yo. Nikirin, V.A. Voitovych, M.V. Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film Functional Materials |
| description |
Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and with the face centered cubic structure for the heated substrate. Surface morphology of films consists of nanocrystalline randomly oriented grains. Increasing of the deposition rate and/or the substrate temperature lead to decrease of the film porosity and enlarge of nanocrystals. The maximum oxidation state of the deposited films is observed near the surface. |
| format |
Article |
| author |
Oberemok, O.S. Sabov, T.M. Lisovskyy, I.P. Khacevych, I.M. Gudymenko, O.Yo. Nikirin, V.A. Voitovych, M.V. |
| author_facet |
Oberemok, O.S. Sabov, T.M. Lisovskyy, I.P. Khacevych, I.M. Gudymenko, O.Yo. Nikirin, V.A. Voitovych, M.V. |
| author_sort |
Oberemok, O.S. |
| title |
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film |
| title_short |
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film |
| title_full |
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film |
| title_fullStr |
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film |
| title_full_unstemmed |
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film |
| title_sort |
influence of deposition rate and substrate temperature on structure and optical features of nio thin film |
| publisher |
НТК «Інститут монокристалів» НАН України |
| publishDate |
2016 |
| topic_facet |
Technology |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/120639 |
| citation_txt |
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ. |
| series |
Functional Materials |
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2023-10-18T20:37:32Z |
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