2D fluid model for interactive development of ICP technological tools

The software for ICP device simulation is worked out. Discharge chamber geometry, RF power, pressure and working
 gas type are the input data. The results of calculation are inductor voltage, ion current density distribution on the
 chamber surface, steady state space distributions o...

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Veröffentlicht in:Вопросы атомной науки и техники
Datum:2006
Hauptverfasser: Gapon, A.V., Dahov, A.N., Dudin, S.V., Zykov, A.V., Azarenkov, N.A.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/82306
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Zitieren:2D fluid model for interactive development of ICP technological tools / A.V. Gapon, A.N. Dahov, S.V. Dudin, A.V. Zykov, N.A. Azarenkov // Вопросы атомной науки и техники. — 2006. — № 6. — С. 186-188. — Бібліогр.: 3 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Gapon, A.V.
Dahov, A.N.
Dudin, S.V.
Zykov, A.V.
Azarenkov, N.A.
author_facet Gapon, A.V.
Dahov, A.N.
Dudin, S.V.
Zykov, A.V.
Azarenkov, N.A.
citation_txt 2D fluid model for interactive development of ICP technological tools / A.V. Gapon, A.N. Dahov, S.V. Dudin, A.V. Zykov, N.A. Azarenkov // Вопросы атомной науки и техники. — 2006. — № 6. — С. 186-188. — Бібліогр.: 3 назв. — англ.
collection DSpace DC
container_title Вопросы атомной науки и техники
description The software for ICP device simulation is worked out. Discharge chamber geometry, RF power, pressure and working
 gas type are the input data. The results of calculation are inductor voltage, ion current density distribution on the
 chamber surface, steady state space distributions of the electric field, plasma density and electron temperature in the
 chamber. Set of 2D parameter distributions is visualized immediately after calculation. The software had been carefully
 verified by comparing the calculation results with real data measured experimentally. The comparison has shown that
 both calculated 2D plasma density and electron temperature profiles and ion current density distribution on the processed
 surface are quite realistic. Graphical geometry input, fast calculation and immediate result visualization makes it
 possible to use our software for interactive development of ICP technological tools.
first_indexed 2025-11-25T22:42:32Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-82306
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1562-6016
language English
last_indexed 2025-11-25T22:42:32Z
publishDate 2006
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
record_format dspace
spelling Gapon, A.V.
Dahov, A.N.
Dudin, S.V.
Zykov, A.V.
Azarenkov, N.A.
2015-05-27T15:26:25Z
2015-05-27T15:26:25Z
2006
2D fluid model for interactive development of ICP technological tools / A.V. Gapon, A.N. Dahov, S.V. Dudin, A.V. Zykov, N.A. Azarenkov // Вопросы атомной науки и техники. — 2006. — № 6. — С. 186-188. — Бібліогр.: 3 назв. — англ.
1562-6016
PACS: 52.35.Hr
https://nasplib.isofts.kiev.ua/handle/123456789/82306
The software for ICP device simulation is worked out. Discharge chamber geometry, RF power, pressure and working
 gas type are the input data. The results of calculation are inductor voltage, ion current density distribution on the
 chamber surface, steady state space distributions of the electric field, plasma density and electron temperature in the
 chamber. Set of 2D parameter distributions is visualized immediately after calculation. The software had been carefully
 verified by comparing the calculation results with real data measured experimentally. The comparison has shown that
 both calculated 2D plasma density and electron temperature profiles and ion current density distribution on the processed
 surface are quite realistic. Graphical geometry input, fast calculation and immediate result visualization makes it
 possible to use our software for interactive development of ICP technological tools.
This work was supported by Ministry of Industrial Policy
 of Ukraine, Project 92373/60
en
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
Вопросы атомной науки и техники
Low temperature plasma and plasma technologies
2D fluid model for interactive development of ICP technological tools
Article
published earlier
spellingShingle 2D fluid model for interactive development of ICP technological tools
Gapon, A.V.
Dahov, A.N.
Dudin, S.V.
Zykov, A.V.
Azarenkov, N.A.
Low temperature plasma and plasma technologies
title 2D fluid model for interactive development of ICP technological tools
title_full 2D fluid model for interactive development of ICP technological tools
title_fullStr 2D fluid model for interactive development of ICP technological tools
title_full_unstemmed 2D fluid model for interactive development of ICP technological tools
title_short 2D fluid model for interactive development of ICP technological tools
title_sort 2d fluid model for interactive development of icp technological tools
topic Low temperature plasma and plasma technologies
topic_facet Low temperature plasma and plasma technologies
url https://nasplib.isofts.kiev.ua/handle/123456789/82306
work_keys_str_mv AT gaponav 2dfluidmodelforinteractivedevelopmentoficptechnologicaltools
AT dahovan 2dfluidmodelforinteractivedevelopmentoficptechnologicaltools
AT dudinsv 2dfluidmodelforinteractivedevelopmentoficptechnologicaltools
AT zykovav 2dfluidmodelforinteractivedevelopmentoficptechnologicaltools
AT azarenkovna 2dfluidmodelforinteractivedevelopmentoficptechnologicaltools