Search Results - Kruglenko, M.P.

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  1. 1
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    About influence of energy of electrons and ions on speed of electron- and ion-stimulated plasmachemical etching of silicon by Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.

    Published 2010
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  2. 2
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    Technological studies of the plasmachemical reactor with сlosed electron drift by Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.

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  3. 3
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    Особенности плазмохимического травления торцов крем­ние­вых плас­тин для фо­то­элек­три­чес­ких пре­об­ра­зо­ва­те­лей... by Fedorovich, O. A., Kruglenko, M. P., Polozov, B. P.

    Published 2009
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  4. 4
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    About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields by Hladkovskiy, V.V., Fedorovich, O.A., Polozov, B.P., Kruglenko, M.P.

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  5. 5
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    Modernized equipment for plasmachemical etching of insulation of p-n transition of photoelectric converters by Fedorovich, O.A., Kruglenko, M.P., Lukomskij, D.V., Marinenko, A.A., Polozov, B.P.

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  6. 6
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    Plasma technologies for manufacturing of micro-strip metal detectors of ionizing radiation by Pugatch, V.M., Perevertaylo, V.L., Fedorovich, O.A., Borisenko, A.G., Kostin, E.G., Kruglenko, M.P., Polozov, B.P., Tarasenko, L.I.

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