About influence of energy of electrons and ions on speed of electron- and ion-stimulated plasmachemical etching of silicon

за авторством Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.
Опубліковано 2010

Technological studies of the plasmachemical reactor with сlosed electron drift

за авторством Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.
Опубліковано 2009

About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields

за авторством Hladkovskiy, V.V., Fedorovich, O.A., Polozov, B.P., Kruglenko, M.P.
Опубліковано 2015

Modernized equipment for plasmachemical etching of insulation of p-n transition of photoelectric converters

за авторством Fedorovich, O.A., Kruglenko, M.P., Lukomskij, D.V., Marinenko, A.A., Polozov, B.P.
Опубліковано 2007

Plasma technologies for manufacturing of micro-strip metal detectors of ionizing radiation

за авторством Pugatch, V.M., Perevertaylo, V.L., Fedorovich, O.A., Borisenko, A.G., Kostin, E.G., Kruglenko, M.P., Polozov, B.P., Tarasenko, L.I.
Опубліковано 2007