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Kruglenko, M.P.
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Kruglenko, M.P.
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Kruglenko, M.P.
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Особенности плазмохимического травления торцов кремниевых пластин для фотоэлектрических преобразователей...
by
Fedorovich, O. A.
,
Kruglenko, M. P.
,
Polozov, B. P.
Published 2009
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2
About influence of energy of electrons and ions on speed of electron- and ion-stimulated plasmachemical etching of silicon
by
Fedorovich, O.A.
,
Kruglenko, M.P.
,
Polozov, B.P.
Published 2010
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3
Technological studies of the plasmachemical reactor with сlosed electron drift
by
Fedorovich, O.A.
,
Kruglenko, M.P.
,
Polozov, B.P.
Published in
Вопросы атомной науки и техники
(2009)
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4
About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields
by
Hladkovskiy, V.V.
,
Fedorovich, O.A.
,
Polozov, B.P.
,
Kruglenko, M.P.
Published in
Вопросы атомной науки и техники
(2015)
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5
Modernized equipment for plasmachemical etching of insulation of p-n transition of photoelectric converters
by
Fedorovich, O.A.
,
Kruglenko, M.P.
,
Lukomskij, D.V.
,
Marinenko, A.A.
,
Polozov, B.P.
Published in
Вопросы атомной науки и техники
(2007)
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6
Plasma technologies for manufacturing of micro-strip metal detectors of ionizing radiation
by
Pugatch, V.M.
,
Perevertaylo, V.L.
,
Fedorovich, O.A.
,
Borisenko, A.G.
,
Kostin, E.G.
,
Kruglenko, M.P.
,
Polozov, B.P.
,
Tarasenko, L.I.
Published in
Вопросы атомной науки и техники
(2007)
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Related Subjects
Низкотемпературная плазма и плазменные технологии
Low temperature plasma and plasma technologies
discharge current
etching rate
monosilicon
photovoltaic cells
plasma-chemical etching
plasma-chemical reactor
монокремний
плазмохимический реактор
плазмохимическое травление
скорость травления
ток разряда
фотоэлектрические преобразователи