Search Results - Polozov, B.P.

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  1. 1
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    The qualitative analysis of the composition of the RF discharge plasma by means of mass-spectrometry by Hladkovskiy, V.V., Polozov, B.P., Fedorovich, O.A.

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  2. 2
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    About influence of energy of electrons and ions on speed of electron- and ion-stimulated plasmachemical etching of silicon by Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.

    Published 2010
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  3. 3
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    Technological studies of the plasmachemical reactor with сlosed electron drift by Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.

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  4. 4
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    Особенности плазмохимического травления торцов крем­ние­вых плас­тин для фо­то­элек­три­чес­ких пре­об­ра­зо­ва­те­лей... by Fedorovich, O. A., Kruglenko, M. P., Polozov, B. P.

    Published 2009
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  5. 5
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    The bias voltage and its influence on the etching rate of silicon by Fedorovich, О.А., Hladkovskiy, V.V., Polozov, B.P., Kruglenko, М.P.

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  6. 6
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    About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields by Hladkovskiy, V.V., Fedorovich, O.A., Polozov, B.P., Kruglenko, M.P.

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  7. 7
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    Modernized equipment for plasmachemical etching of insulation of p-n transition of photoelectric converters by Fedorovich, O.A., Kruglenko, M.P., Lukomskij, D.V., Marinenko, A.A., Polozov, B.P.

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  8. 8
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    Влияние параметров ВЧ-разряда и параметров нагревателя на температуру подложки в плазмохимическом реакторе «Алмаз» для синтеза углеродных алмазоподобных пленок... by Hladkovskiy, V. V., Kostin, E. G., Polozov, B. P., Fedorovich, O. A., Petriakov, V. A.

    Published 2014
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  9. 9
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    Влияние плазмохимического травления на структуру поверхности кремниевых пластин фотоэлектрических преобразователей... by Polozov, B. P., Fedorovich, O. A., Golotyuk, V. N., Marinenko, A. A., Lukomsky, D. V.

    Published 2006
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  10. 10
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    Плазмохимическое травление эпитаксиальных структур нитрида галлия by Borisenko, A. G., Polozov, B. P., Fedorovich, O. A., Boltovets, M. S., Ivanov, V. N., Sveschnikov, Yu. N.

    Published 2005
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  11. 11
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    Формирование мезаструктур 4НSiC p–i–n-диодов методом ионно-плазменного травления by Boltovets, M. S., Borisenko, A. G., Ivanov, V. N., Fedorovich, О. А., Krivutsa, V. A., Polozov, B. P.

    Published 2009
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  12. 12
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    Модуляционная поляриметрия полного внутреннего отражения, нарушенного алмазоподобными пленками by Maximenko, L. S., Mishchuk, O. N., Matyash, I. E., Serdega, B. K., Kostin, E. G., Polozov, B. P., Fedorovich, O. A., Savinkov, G. K.

    Published 2013
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  13. 13
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    Plasma technologies for manufacturing of micro-strip metal detectors of ionizing radiation by Pugatch, V.M., Perevertaylo, V.L., Fedorovich, O.A., Borisenko, A.G., Kostin, E.G., Kruglenko, M.P., Polozov, B.P., Tarasenko, L.I.

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