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Hydrogen reduction of silicon tetrachloride in low temperature non-equilibrium plasma of induction RF discharge

In this work, silicon is obtained by plasma-chemical reduction of silicon tetrachloride in an argon-hydrogen low- temperature nonequilibrium plasma. It is shown that in the investigated range of process parameters, the energy cost of producing one kilogram of silicon is in the range of 150…190 kW/h...

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Bibliographic Details
Main Authors: Deryzemlia, A.N., Yevsiukov, A.I., Radchenko, V.I., Khizhnyak, D.A., Kryshtal, P.G., Zhuravlov, A.Yu., Shijan, A.V., Strigunovskiy, S.V., Pelypets, Yu.A., Shirokov, B.M.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
Series:Вопросы атомной науки и техники
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Online Access:http://dspace.nbuv.gov.ua/handle/123456789/194836
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