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Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique

Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique

Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile s...

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Bibliographic Details
Main Authors: Shapovalov, A.P., Korotash, I.V., Rudenko, E.M., Sizov, F.F., Dubyna, D.S., Osipov, L.S., Polotskiy, D.Yu., Tsybrii, Z.F., Korchovyi, A.A.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2015
Series:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/121821
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http://dspace.nbuv.gov.ua/handle/123456789/121821

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