Structure of tantalum diboride thin films deposited by RF-magnetron sputtering

• Дата: 2008
• Автори: Konovalov, V.A., Terpiy, D.N., Klyahina, N.A., Kostenko, I.G., Vasetskaya, L.A.
• Формат: Стаття
• Мова: English
• Опубліковано: НТК «Інститут монокристалів» НАН України 2008
• Назва видання: Functional Materials
• Теми: Technology
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/137237
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Structure of tantalum diboride thin films deposited by RF-magnetron sputtering / V.A. Konovalov, D.N. Terpiy, N.A. Klyahina, I.G. Kostenko, L.A. Vasetskaya // Functional Materials. — 2008. — Т. 15, № 1. — С. 144-148. — Бібліогр.: 12 назв. — англ.

The tantalum diboride films have been deposited in various conditions by non-reactive RF magnetron sputtering. The film phase compositions and structures have been determined by X-ray diffraction, secondary ion mass spectrometry, and electron microscopy. The effect of the substrate temperature and o...