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Experimental research of ICP reactor for plasma-chemical etching

Experimental research of ICP reactor for plasma-chemical etching

The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power) have been carried out as well as probe measurements of spatial d...

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Bibliographic Details
Main Authors: Dudin, S.V., Zykov, A.V., Dahov, A.N., Farenik, V.I.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
Series:Вопросы атомной науки и техники
Subjects:
Low temperature plasma and plasma technologies
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/82289
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http://dspace.nbuv.gov.ua/handle/123456789/82289

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