Experimental research of ICP reactor for plasma-chemical etching
The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power) have been carried out as well as probe measurements of spatial d...
Збережено в:
| Дата: | 2006 |
|---|---|
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
|
| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/82289 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
irk-123456789-82289 |
|---|---|
| record_format |
dspace |
| spelling |
irk-123456789-822892015-05-28T03:02:21Z Experimental research of ICP reactor for plasma-chemical etching Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. Low temperature plasma and plasma technologies The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power) have been carried out as well as probe measurements of spatial distribution of local plasma parameters (plasma density, temperature and electron energy distribution function) and radial profiles of ion current to processed surface. The measured dependences differ essentially for atomic (Ar) and molecular (O₂,N₂,CF₄) gases. As the range of working pressure covers diffusive and collisionless modes of charged particles movement, radial distribution of ion current density and its absolute value change significantly. Comparison of the obtained results with the calculations executed using “Global” spatially averaged model and 2D-fluid model is carried out. 2006 Article Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ. 1562-6016 PACS: 52.77.Bn http://dspace.nbuv.gov.ua/handle/123456789/82289 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Low temperature plasma and plasma technologies Low temperature plasma and plasma technologies |
| spellingShingle |
Low temperature plasma and plasma technologies Low temperature plasma and plasma technologies Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. Experimental research of ICP reactor for plasma-chemical etching Вопросы атомной науки и техники |
| description |
The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented
in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power)
have been carried out as well as probe measurements of spatial distribution of local plasma parameters (plasma density,
temperature and electron energy distribution function) and radial profiles of ion current to processed surface. The
measured dependences differ essentially for atomic (Ar) and molecular (O₂,N₂,CF₄) gases. As the range of working
pressure covers diffusive and collisionless modes of charged particles movement, radial distribution of ion current density
and its absolute value change significantly. Comparison of the obtained results with the calculations executed using
“Global” spatially averaged model and 2D-fluid model is carried out. |
| format |
Article |
| author |
Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. |
| author_facet |
Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. |
| author_sort |
Dudin, S.V. |
| title |
Experimental research of ICP reactor for plasma-chemical etching |
| title_short |
Experimental research of ICP reactor for plasma-chemical etching |
| title_full |
Experimental research of ICP reactor for plasma-chemical etching |
| title_fullStr |
Experimental research of ICP reactor for plasma-chemical etching |
| title_full_unstemmed |
Experimental research of ICP reactor for plasma-chemical etching |
| title_sort |
experimental research of icp reactor for plasma-chemical etching |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2006 |
| topic_facet |
Low temperature plasma and plasma technologies |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/82289 |
| citation_txt |
Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ. |
| series |
Вопросы атомной науки и техники |
| work_keys_str_mv |
AT dudinsv experimentalresearchoficpreactorforplasmachemicaletching AT zykovav experimentalresearchoficpreactorforplasmachemicaletching AT dahovan experimentalresearchoficpreactorforplasmachemicaletching AT farenikvi experimentalresearchoficpreactorforplasmachemicaletching |
| first_indexed |
2024-03-30T08:18:16Z |
| last_indexed |
2024-03-30T08:18:16Z |
| _version_ |
1796146862760132608 |