Technological studies of the plasmachemical reactor with сlosed electron drift

by Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.
Published 2009

Особенности плазмохимического травления торцов крем­ние­вых плас­тин для фо­то­элек­три­чес­ких пре­об­ра­зо­ва­те­лей...

by Fedorovich, O. A., Kruglenko, M. P., Polozov, B. P.
Published 2009

About influence of energy of electrons and ions on speed of electron- and ion-stimulated plasmachemical etching of silicon

by Fedorovich, O.A., Kruglenko, M.P., Polozov, B.P.
Published 2010

About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields

by Hladkovskiy, V.V., Fedorovich, O.A., Polozov, B.P., Kruglenko, M.P.
Published 2015